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薄栅氧化膜的单晶片热壁快速热处理
We have developed single-wafer furnace rapid thermal process (RTP) modules for thermal oxidation of silicon substrates. ...
碳化硅单晶的制造方法
The soft surfaced particles in slurries according to embodi-ments of the invention have been found to unexpectedly pro-v...
单晶石英制造复杂结构的微加工技术研究
Abstract: Single-crystal quartz material is widely applied in the manufacture of resonators anosensors, but it is diffic...
阳极氧化与机械抛光相结合的SiC单晶抛光研究
For high-quality and effective polishing of SiC, a novel polishing technique that combines anodic oxidation and mechani...
阳极氧化与机械抛光相结合的SiC单晶抛光研究
Abstract: Low-temperature direct Plasma-Enhanced Chemical Vapor Deposition (PECVD) oxide to thermal oxide bonding is de...
超薄单晶硅微结构
ABSTRACTThis paper discusses the fabrication of submicron p'microstructures for a number of MEMS applications using boro...
单晶锗刻蚀速率的研究
A study has been made of the rate at which single-crystal germanium is etched under various conditions. For simplicity,...
单晶片兆波系统中的二氧化碳溶解水清洗方法
Introduction Megasonic cleans have been applied to remove defects such as particles and polymer/resist residues in sil...
HF-HCl-H2O2混合物在单晶硅晶片上的结构分析
INTRODUCTIONWet-chemical treatments of silicon surfaces are frequently used for several different processing steps in p...
化合物半导体单晶片清洗技术
INTRODUCTION We have developed a novel single wafer cleaning technology that targets the needs of compound semiconduct...