湿法解决方案 半导体资材 泛半导体湿法实验室 数据库
单晶相关内容
当前位置： 网站首页 TAG: 单晶
半导体资料丨颗粒、表面清洗工艺、熔融石英玻璃、硅腐蚀
半导体应用中颗粒形成、传输、沉积和过滤的基础研究 在半导体制造过程中，防止和控制颗粒污染是提高半导体产率的关键。为了控制和减少半导体制造过程中的纳米颗粒污染，应该同时研究颗粒的形成、输运、沉积和过滤。本文研究的目的是1)证明无颗粒环境中的颗...
基于金属电化学腐蚀的单晶SiC Si面腐蚀磨损性能
Abstract Herein, we proposed a chemical mechanical polishing method for single-crystal SiC based on metal electrochemica...
半导体资料丨场效应晶体管，二维光子晶体，单晶复合氧化物膜
基于单层石墨烯和石墨烯衍生材料的场效应晶体管 The progress of advanced materials has invoked great interest in promising novel biosensing appli...
用 NaOH 溶液在单晶硅表面制造倒金字塔结构
ABSTRACT Low-cost aqueous alkaline etching has been widely adopted for monocrystalline silicon surface texturing in cu...
不同后处理工艺条件下单晶硅表面质量及损伤性能的研究
Abstract: Detecting subsurface defects in optical components has always been challenging. This study utilizes laser scat...
通过缓冲层控制进行晶圆级单晶 MoS2单层外延
Monolayer molybdenum disulfide (MoS2), an emergent two-dimensional (2D) semiconductor, holds great promise for transcend...
蚀刻对薄膜单晶铌谐振器的影响
Abstract. A single crystal niobium thin film was grown using molecular beam epitaxy on a c-plane sapphire wafer. Several...
不同后处理工艺单晶硅表面质量及损伤特性的研究
Abstract: Detecting subsurface defects in optical components has always been challenging. This study utilizes laser scat...
MPCVD同质外延单晶金刚石生长的最新进展
ABSTRACT Microwave plasma chemical vapor deposition (MPCVD) is regarded as one of the most promising techniques for the...
SmOFe1− xCoxAs 单晶的生长和表征
A B S T R A C TIn this work we report the crystal growth of SmOFe1−𝑥Co𝑥As single crystals with Co content 0 ≤ 𝑥 ≤ 0.25 v...