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碳酸氢钠溶液氧化单晶硅太阳能电池的研究
1 INTRODUCTION The photovoltaic technology is well established as a reliable and economical one for small sources of e...
用于 CVD金刚石沉积的氮化硅表面预处理
I. Introduction SILICON NITRIDE (Si3N4) based ceramics are considered adequate substrates for growth of chemical vapor d...
硅的湿化学蚀刻机理
ABSTRACT We review what can be said on wet chemical etching of single crystals from the viewpoint of the science of c...
HF与HNO3混合物中硅的湿化学蚀刻机理的研究
Experimental All experiments were carried out under controlled quasiisothermal conditions by using a cryostat Polystat ...
晶体硅光伏组件的腐蚀及其对性能的影响
The solar photovoltaic (PV) market is growing rapidly, with the cumulative global PV capacity growing from 100.5 GW in ...
8寸氧化硅刻蚀加腔项目中标结果公告
项目名称：8寸氧化硅刻蚀加腔项目招标产品列表(主要设备):8寸氧化硅刻蚀加腔项目1招标人：上海积塔半导体有限公司开标时间：2023-03-28 09:30公示时间：2023-03-31 11:40 - 2023-04-03 23:59中标结...
异丙醇酒精蒸发法对硅的动态湿蚀刻
1. IntroductionThe experiments have demonstrated that, for the same sample, it is possible to obtain different pyramidal...
薄膜硅太阳能电池氧化锌的化学蚀刻
1. Introduction Thin-film silicon solar cells rely on light trapping to improve their conversion efficiency from light t...
碳化硅在碱性溶液中的阳极刻蚀
1. Introduction There is strong renewed interest in silicon carbide (SiC) for device applications. With a favourable lat...
硅太阳能电池基板的湿化学处理及电子界面特性
1. IntroductionMost of the technological applications of silicon (Si) in semiconductor device manufacturing are based on...