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用于刻蚀多晶硅表面的HF-HNO3-H2SO4/H2O混合物
Wet chemical etching is of enormous relevance to silicon solar cell processing. Conventional acidic etching mixtures con...
用磷酸揭示氮化硅对二氧化硅的选择性蚀刻机理
1. Introduction Information technology (IT) has brought immense transition on our modern society. To enhance memory dens...
硅薄膜太阳能电池的铝薄膜
The thicknesses of ZnO:Al thin films are tested with surface profiler with the accuracy of 10 nm ( Dektak 3030, Veeco I...
使用单个蚀刻掩模制造硅MEMS结构的改进的各向异性湿法蚀刻工艺
The feasibility of a desired shape of a microstructure on any kind of silicon wafer (e.g. (111), (110), or (100)) is de...
HF溶液中硅基质的铜污染机理
As the dimensions of semiconductor devices are downsized, aiming at manufacturing VLSI and ULSI circuits, the cleaning...
Fe和Cu污染对硅衬底少数载流子寿命的影响
The deleterious effects of metallic contamination on silicon devices have drawn the attention of researchers since the e...
HF溶液阳极氧化形成多孔硅层的机理
The anodic current-potential characteristics of four types of silicon in HF aqueous solutions have been studied. Accordi...
碳化硅太阳能电池的湿式化学处理
ABSTRACT: Wet chemical processes are widely used within crystalline silicon solar cell production, mainly for surface t...
锗光电探测器与非晶硅基板上的非晶硅波导单体集成
Abstract: We present a proof-of-concept demonstration of a Ge/a-Si hybrid photonic integrated circuit platform utilizin...
PR-Mask氧化硅湿蚀刻工艺中枝晶状缺陷的去除方法
Dendrites are ramifified crystals, exhibiting morphological features that display crystallographic directionality, such ...