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光电化学蚀刻法制备多孔硅的化学、形态学和电学性能
In this work, the nanocrystalline porous silicon (PS) films is prepared by photoelectrochemical etching of n-type silic...
多晶硅材料中金属杂质的化学性质及其分布
We present a comprehensive summary of our observations of metal-rich particles in multicrystalline silicon (mc-Si) solar...
微电子芯片和太阳能电池用硅片加工的生命周期评估
Purpose The life cycle assessment of silicon wafer processing for microelectronic chips and solar cells aims to provide ...
快速热化学气相沉积设备中硅片的热分布评估
Rapid Thermal Processing (RTP) is currently a very popular technology. It is widely used for many applications in semico...
氧化铝薄膜用于硅片表面钝化
In the present work, alumina gel was developed for passivating silicon wafers. The alumina gel was prepared by sol–gel ...
集成电路用硅基介质膜的高密度等离子体化学气相沉积
In this paper, we present and review recent developments in the high-density plasma chemical vapor deposition (HDP CVD) ...
硅片蚀刻MACE过程中化学镀金的优化
Deep etching of silicon (Si) is very much desirable for wide variety of applications. Under the context, a cost effffect...
用局部刻蚀法和电热原子吸收光谱法测定硅晶片中的金属杂质
An etching technique for the determination of the metallic impurities distribution in silicon wafers has been developedA...
DDMAF化学辅助抛光单晶硅
The need for polishing silicon wafer is to obtain a smooth surface for sprucing the semiconductor devices on the wafer ...
光伏多晶硅晶界杂质吸收与钝化的层次结构
This thesis examines grain boundaries, dislocations and metallic impurities in photovoltaic multicrystalline silicon (P...