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碳化硅的新型光子应用
Abstract: Silicon carbide (SiC) is emerging rapidly in novel photonic applications thanks to its unique photonic propert...
晶硅片各向异性表面制绒工艺实验分析
ABSTRACTThe development of silicon devices, circuits, and systems in most cases relies on the wet-chemical etching of s...
集成硅光子 MEMS
Abstract Silicon photonics has emerged as a mature technology that is expected to play a key role in critical emerging a...
基于氢氧化钾各向异性刻蚀的高固硅微针制备
Abstract This thesis presents the research on the high solid silicon microneedles fabrication based on KOH anisotropic ...
用于p型晶体硅表面钝化的溶液处理氧化铝薄膜
Abstract Efficient and inexpensive photovoltaic systems are necessary to meet the increasing global electricity demand....
硅半导体的光辅助电化学锂化
ABSTRACT Charging rate of present lithium-ion batteries is needed to be fast for energy storage of electric vehicles. L...
氮化硅表面的蚀刻和化学控制
1. Si2p and F1s XPS spectra of Si3.4N4 before and after etching in HF and NH4FFigure S1. XPS spectra of the (A) Si2p reg...
硅、锗、砷化镓和磷化镓的化学蚀刻
AbstractThis paper considers the nature and value of the information contained in the distribution of good circuits acr...
硅的湿法化学刻蚀机理
ABSTRACT We review what can be said on wet chemical etching of single crystals from the viewpoint of the science of c...
硅加工中化学刻蚀缺陷修饰与表面抛光的回顾与统一分析
A comprehensive review of dynamics of etching and its various applications in silicon wafer processing is accomplished, ...