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晶体硅各向异性湿法化学刻蚀过程中的表面形貌
Abstract. The rich variety of micron-scale features observed in the orientationdependent surface morphology of crystalli...
用硝酸和氢氟酸刻蚀硅的研究
摘要：本文提出了一种数字蚀刻方法，以实现对蚀刻深度的精确控制。该方法使用HNO3氧化和BOE氧化物去除工艺的组合，对p+ Si和Si0.7Ge0.3的数字蚀刻特性进行了研究。实验表明，由于低激活能，氧化会随着时间的推移而饱和。提出了一种物理...
用导电聚合物功能化介孔硅的晶圆级制造
The fabrication of hybrid materials consisting of nanoporous hosts with conductive polymers is a challenging task, since...
高温处理对外延生长 P 型硅片的影响
Conventional silicon (Si) wafers are produced by energy-intensive ingot crystallization which is responsible for a major...
用 NaOH 溶液在单晶硅表面制造倒金字塔结构
ABSTRACT Low-cost aqueous alkaline etching has been widely adopted for monocrystalline silicon surface texturing in cu...
湿法加工过程中污染物在硅介质上的沉积
AbstractThe evaluation of photovoltaic man-ufacturing wet process steps shows howimpurities may be deposited on siliconm...
不同后处理工艺条件下单晶硅表面质量及损伤性能的研究
Abstract: Detecting subsurface defects in optical components has always been challenging. This study utilizes laser scat...
具有改进制造工艺的低能离子注入和深台面硅雪崩光电二极管
Abstract: Since the avalanche phenomenon was first found in bulk materials, avalanche photodiodes (APDs) have been exclu...
晶硅太阳能电池制造技术方面 – 背景和基础材料
ABSTRACT In this paper the first part of complete technological process of manufacturing crystalline silicon solar cell...
比较N 型和 P 型硅纳米结构的金属辅助化学蚀刻
ABSTRACT Metal assisted chemical etching is a promising method for fabricating high aspect ratio micro- and nanostructu...