蚀刻时间和过氧化氢浓度对ZnO玻璃基板的影响
The purpose of the study is to determine the best technique for etching ZnO thin films. ZnO is deposited on the glass substrate using a radio frequency sputtering equipment. To etch the ZnO thin film, hydrogen peroxide (H2O2) concentrations of 10%, 20%, and 30% are utilised, with etching times of 30 and 60 seconds. The optical band gap is lowered after a specific quantity of etching, which shows that the film's crystallinity quality has improved. The impact of various ZnO thicknesses on the sample's optical properties is investigated using OPAL 2 simulator. In comparison to other ZnO layers of varied thickness, the OPAL 2 simulation shows that the 400 nm ZnO layer has the lowest transmission in the UV wavelength range.
晶体硅/黑硅/钙钛矿串联结构的光学模拟与实验研究
In this work, the optical properties of these structures were modeled using the transfer matrix method, where an array of cone-like nanoneedles of the b-Si interlayer is approximated as a homogeneous optical medium, for which the effective complex refractive index is the weighted average of those for Si and perovskite. Analytical equations are obtained for tandem structures’reflection, transmission, and absorption. The simulated reflectance spectra of the structures were compared with those of structures without the b-Si layer, as well as with experimental data. Numerical calculations and experiments confirm that nanotexturing significantly improves the optical properties of tandem structures.
表面化学蚀刻的 MOCVD GaN 结构的发光特性
This work aimed to improve the scintillation characteristics of MOCVD GaN by a wet etching method. An additional blue photo-luminescence (B-PL) band peaking at 2.7–2.9 eV and related to dislocations was discovered. This B-PL band intensity appeared to be dependent on wet etching exposure. The intensity of the B-PL was considerably enhanced when recorded at rather low temperatures. This finding resembles PL thermal quenching of B-PL centers. The mechanisms of scintillation intensity and spectrum variations were examined by coordinating the complementary photo-ionization and PL spectroscopy techniques.
关键词：氮化镓、湿式蚀刻、光致发光、脉冲光电离光谱学、过氧化氢、湿式蚀刻、氧化锌薄膜、射频溅射、玻璃基板、晶体硅、黑硅、钙钛矿
